国家/地区 中国（2）
IPC部 B（2）
IPC大类 B05（2） C01（2）
IPC小类 B05D（2）
IPC B05D005/00（2）
发明人
公开年
申请年 2011（2）
专利权人

Method for preparing patterned graphene film, involves soaking substrate in acetone or photoresist peeling solution to remove photoresist or poly(methyl methacrylate) on graphene film to obtain patterned graphene film.

DAI T, YAO Q, ZHANG F

Film, useful in semiconductor devices for displays devices and field effect transistors, comprises a base layer having amino groups, and a reduced graphene oxide layer formed on the base layer.

KOBAYASHI T, TOSHIYUKI K