国家/地区 中国（8）
IPC部 C（8）
IPC大类 C01（8） C08（3）
IPC小类 C01B（8）
IPC C01B031/04（8） C08K003/04（3） C08K009/04（3）
发明人 ZHONG C（8）
公开年 2015（7）
申请年 2015（8）
专利权人 SUZHOU ZHUOW.（4） QINGDAO HUAG.（3）

Reducing graphene oxide comprises using tea polyphenol as reducing agent for reducing graphene oxide to obtain graphene.

ZHONG C, WANG W

Preparing modified graphene oxide/poly methyl methacrylate composite material comprises e.g. modifying graphene oxide surface, reducing modified graphene oxide, dissolving in N-methyl-2-pyrrolidone and dispersing in poly methyl methacrylate.

ZHONG C, WANG W

Preparation of graphene/poly (2,2'-(p-oxydiphenylene)-5,5'-bibenzimidazole) composite material comprises using methane sulfonic acid as solvent to carry out direct ultrasonic liquid phase separation of graphite to obtain graphene.

ZHONG C, WANG W

Preparation of modified graphite oxide/polyimide composite material comprises modifying graphite oxide surface, recycling, dissolving modified graphene in N-methyl-2-pyrrolidone, blending, and dispersing in polyimide solution.

WANG W, ZHONG C

Preparation of surface-modified graphene oxide by subjecting graphene oxide to surface modification using amino-terminated poly-p-phenylene diamine terephthalamide oligomer modifying agent, and adding hydrazine hydrate as reducing agent.

WANG W, ZHONG C

Intelligent graphene microwave heating reduction furnace has furnace cavity that is set with automatic discharger, second nitrogen valve that is united to vacuum pump, and vacuum degree sensor that is united to second control element.

GUO H, PAN D, QIAN F, SHI J, ZHONG C

Photoelectric control device for production of graphene, has signal process unit connected to LED lamp and solenoid valve, water level controller set in sample pool left portion, and pressure dividing resistor connected with amplifier.

PAN D, QIAN F, SHI J, WEI W, ZHONG C

Producing single layer graphene involves adding concentrated sulfuric acid into automatic feeding unit, and then adding phosphorus pentoxide and graphite powder with stirring.

PAN D, QIAN F, SHI J, WANG F, WU C, ZHONG C