国家/地区 中国（4）
IPC部 C（4）
IPC大类 C01（4） C23（2）
IPC小类 C01B（4）
IPC C01B031/04（3） C01B032/184（2） C23C016/26（2）
发明人 ZHANG Z（4）
公开年
申请年
专利权人 IND TECHNOLO.（3）

Method of making a pellicle for use in extreme ultraviolet (EUV) lithography system, by depositing graphene layer over first material layer, and depositing amorphous silicon layer over graphene layer.

TU C, CHEN C, YOO C S, CHANG J, TSAI C, LIU P, LEE H, LIN C, LIN Y, TU Z, CHEN J, CAI J, YOU Q, ZHANG Z, LIN Z, LIU B, LI X, YOO C

Manufacture of graphene for graphene material, involves purging hydrocarbon gas and auxiliary gas into variable pressure coupled plasma apparatus, applying intermediate frequency electromagnetic wave and dissolving hydrocarbon gas.

HUANG K, ZHANG Z, KOU C, HUANG K P, CHANG C C, KOU C S

Apparatus for manufacturing graphene sheets comprises gas tube, hydrocarbon gas source, microwave generator for generating microwave passing the tube through waveguide tube to form microwave plasma torch from gas and tube collector.

HUANG K, CHANG C, KOU C, HSIEH Y, XIE Y, ZHANG Z, HUANG K P, CHANG C C, KOU C S, HSIEH Y T

Method for forming e.g. multi-layered graphene layer deposited on glass substrate, involves utilizing microwave with electron cyclotron resonance mechanism to excite carbon-containing gas to deposit graphene layer on substrate.

HUANG K, CHANG C, HSIEH Y, CHIU P, MEDINA H, QIU B, XIE Y, ZHANG Z, MEDIONA H, HUANG K P, CHANG C C, HSIEH Y T, CHIU P W