国家/地区 韩国（2） 美国（2）
IPC部 B（2） C（2） H（2）
IPC大类 B01（2）
IPC小类 B01J（2）
IPC B01J019/12（2）
发明人
公开年
申请年 2013（2）
专利权人

Restoring properties including charge neutrality point, doping state, carriers and conductivity of graphene used for silicon treatment of graphene, comprises grounding graphene, and exposing graphene to plasma having specified density.

CHOI J, YOO W, LEE S, LIM Y, CHOI J Y, LEE S H, LIM Y D, YOO W J

Method for forming film of graphene involves placing substrate in processing chamber at reduced pressure, performing surface treatment process on portion of substrate, and providing carbon-containing material in processing chamber.

BOYD D A