国家/地区 日本（6）
IPC部 B（6）
IPC大类 C01（6） B82（5） H01（5）
B01（4） C08（4） C09（4）
H05（3） B29（2） B33（2）
C04（2） C10（2）
IPC小类 C01B（6）
IPC C01B031/04（6）
发明人 HASEGAWA S（3） HASEGAWA SHOJI（3） KAMIYA N（3）
KAMIYA NAGISA（3） KWON W（2） KWON W J（2）
LEE K（2） LEE K S（2） NAGISA K（2）
SHEN Y（2） SHOJI H（2） SOHN K（2）
SOHN K N（2） YOO K（2） YOO K H（2）
公开年 2015（6）
申请年 2014（5） 
专利权人 GRAPHENE PLA.（3） GRAPHENE PLA.（2） LG CHEM CO L.（2） LG CHEM LTD（2）

Graphite-based carbon material used as graphene precursor for preparing graphene dispersion, comprises rhombohedral graphite layer and hexagonal graphite layer, and has specified rate calculated based on X-ray diffraction method.

HASEGAWA S, KAMIYA N, HASEGAWA SHOJI, KAMIYA NAGISA, SHOJI H, NAGISA K, SHEN Y

Graphene nanoribbon comprises repeating unit comprising edge carbons which can unambiguously be assigned as zigzag or cove type carbon atoms.

SCHWAB M G, MUELLEN K, FENG X, YANG B, DUMSLAFF T, FASEL R, RUFFIEUX P, LIU J, CAI J, SANCHEZSANCHEZ C, MULLEN K, SANCHEZ S C, TSAI J, MILLEN K

Production of graphene involves applying physical force to liquid dispersion of dispersing agent containing polyaromatic hydrocarbon oxide, and carbon-based material comprising graphite, and forming graphite into nano graphene flakes.

SOHN K N, YOO K H, KWON W J, LEE K S, YANG S B, KIM I Y, LEE M J, LEE J Y, SOHN K, YOO K, KWON W, LEE K, YANG S, KIM I, LEE M, LEE J, LI M, LI J

Production of graphene involves forming liquid dispersion comprising dispersing agent, and carbon-based material comprising de-oxidized graphite, and continuously passing liquid dispersion through high-pressure homogenizer.

YOO K H, SOHN K N, KWON W J, LEE K S, YOO K, SOHN K, KWON W, LEE K

Graphene composition for graphene molding comprises organic compound, graphene with flakes, and dispersing agent.

HASEGAWA SHOJI, KAMIYA NAGISA, HASEGAWA S, KAMIYA N

Graphite-type carbon raw material used as graphene precursor, has rhombohedral system graphite layer and hexagonal system graphite layer in ratio more than preset value, as measured using peak intensities specific planes of layers.

HASEGAWA S, KAMIYA N, SHOJI H, NAGISA K, HASEGAWA SHOJI, KAMIYA NAGISA, SHEN Y