国家/地区
IPC部 B（2） C（2）
IPC大类 C01（2）
IPC小类 C01B（2）
IPC C01B032/198（2）
发明人
公开年 2023（2）
申请年 2022（2） 
专利权人

Depositing graphene or graphene oxide onto substrate from gaseous source of carbon precursor involves using plasma-enhanced chemical vapor deposition method, where carbon precursor consists of ethylene and the process is carried out in absence of carrier gas.

JOUIAD M, EL MARSSI M, LEJEUNE M

Method for performing metallization process in surface of graphene metal-based composite material used in e.g aerospace, involves adding reducing agent for fully stirring, separating, water washing and drying to obtain surface metallization of graphene powder.

HU Y, ZHANG Q, LI Q