国家/地区 世界知识产权组织（2）
IPC部 C（2）
IPC大类 C01（2） C30（2）
IPC小类 C01B（2）
IPC C01B032/184（2）
发明人
公开年 2023（2）
申请年 2022（2）
专利权人

Pellicle used for reticle for extreme-UV exposure, comprises pellicle film through which extreme-UV rays transmit and support frame for supporting pellicle film, where pellicle film comprises multilayer thin film structure.

KIM Y H, KIMYONGHWAN

Device used to conversion of feedstock to resultant material having higher degree of crystallinity than feedstock comprises constraining reservoir, electrodes, compression system, alternating current power source and electrical controller.

MANCEVSKI V, LUONG D X, COOKSEY T, WILLIAMS J, MAZOR E, ZHANG Z, JAY B