国家/地区 中国（2）
IPC部 B（2）
IPC大类 C01（2）
IPC小类 C01B（2）
IPC
发明人 ZHANG F（2）
公开年
申请年 2011（2）
专利权人

Method for preparing patterned graphene film, involves soaking substrate in acetone or photoresist peeling solution to remove photoresist or poly(methyl methacrylate) on graphene film to obtain patterned graphene film.

DAI T, YAO Q, ZHANG F

Manufacture of cobalt/graphene composite material involves dispersing graphite oxide in glycol solution, adding cobalt salt, anhydrous sodium acetate and polyethylene glycol, heating, cooling, centrifuging, washing and drying.

LI Y, WANG H, ZHANG F, ZHANG Q