国家/地区 美国（2）
IPC部 C（2）
IPC大类 C09（2）
IPC小类 C09D（2）
IPC G03F007/00（2）
发明人
公开年
申请年
专利权人

Composition used in forming thin film, comprises chemical contrast pattern having first region of first chemistry on background of second chemistry, and microphase-separated block copolymer material overlying the chemical contrast pattern.

ARNOLD M, JACOBBERGER R, NEALEY P, XIONG S, CHANG T, MA Z, NEALEY P F

Composition used for forming pattern, comprises graphene derivative including hydrophilic group, and solvent.

KIM H, PARK C H, OKAYASU T, WANG X, PAWLOWSKI G, HAMA Y, KIM H W, WANG X W, XIAOWEI W, GEORG P, YUSUKE H