国家/地区 世界知识产权组织（2）
IPC部 C（2）
IPC大类 C09（2）
IPC小类 C09D（2）
IPC G03F007/004（2）
发明人
公开年 2021（2）
申请年
专利权人

Composition used in forming thin film, comprises chemical contrast pattern having first region of first chemistry on background of second chemistry, and microphase-separated block copolymer material overlying the chemical contrast pattern.

ARNOLD M, JACOBBERGER R, NEALEY P, XIONG S, CHANG T, MA Z, NEALEY P F

Photo-resist welding ink useful for light-emitting diode display printed circuit board boards, comprises oligomer, photoinitiator, nano black filler, flatting agent, coupling agent and solvent, epoxy resin and functional monomer.

LI X, XU X, XIA J, GAN Z, WU L