国家/地区 |
美国(8)![]() |
IPC部 |
C(8)![]() |
IPC大类 |
D01(8)
B82(3)
C01(3)
C08(3) C09(3) D06(3) H01(3) |
IPC小类 |
D01D(8)![]() |
IPC |
D01D005/00(8)![]() |
发明人 |
CHO K(2)
CHO Y(2)
KIM H(2)
PARK S(2) SHIN M(2) YEO C(2) |
公开年 | 2018(3) 2021(2) |
申请年 | 2018(2) 2020(2) |
专利权人 | AICT(2) PURITECH CO .(2) |
JEONG U, MOON S, MUN S M
PARK S, SHIN M, KIM H, YEO C, CHO Y, CHO K
POLYZOS G, SHARMA J K, VLASSIOUK I V, SCHAFFER D A, DATSKOS P G, LACLAIR T J, PARK J
ROGERS R D, ZAVGORODNYA O, SHAMSHINA J L, GURAU G
PARK S, SHIN M, KIM H, YEO C, CHO Y, CHO K
KOENDERS B M, MEERMAN J J, KAMPERMAN S M, WAARBEEK TER R F, JONG DE J, RADIER A A T, OTTO M J, WAARBEEK T R F, JONG D J, MEERMAN YA Y, JONG D Y, OTTO M YA