国家/地区 台湾（2）
IPC部 C（2）
IPC大类 C01（2） C30（2） H01（2）
IPC小类 C01B（2）
IPC C01B032/182（2）
发明人
公开年 2022（2）
申请年 2022（2）
专利权人

Upper electrode assembly used in plasma processing apparatus, has heat transfer sheet that is mounted between electrode plate and metal plate and having vertically oriented portion with vertically oriented graphene structures.

TSUJIMOTO H, KOBUNE T, LI L, LEE L, KOBUNEDAKAKI

Wafer used to chemical vapor deposition growth of uniform graphene comprises planar silicon substrate, insulating layer provided across silicon substrate, and barrier layer provided across the insulating layer.

DIXON S, KAINTH J, JAGT R, GUINEY I, BADCOCK T J