国家/地区 美国（4）
IPC部 C（4）
IPC大类 C23（4）
IPC小类 C23C（4） C01B（2）
IPC C23C016/44（4）
发明人
公开年 2023（4）
申请年 2022（4） 
专利权人

Anode active material comprises carbon material, and silicon structure attached to carbon material, where silicon structure includes silicon nanoparticle, metal thin film formed on surface of silicon nanoparticle, and graphene coated on surface of metal thin film.

KIM Y H, SON M W, KIM Y, SUN M

Film forming method involves loading substrate into processing container, forming interface layer having amorphous structure or microcrystalline structure on substrate by plasma of first mixed gas including carbon-containing gas and forming graphene film on interface layer.

NAKAMURA G, TERADA H, MATSUMOTO T, KABUKI N, WADA M, IFUKU R, NAKAMURA K, KAMURAGI N

Process for instantiating elemental metal within ultramicro pore of nanoporous carbon powder composition involves initiating gas flow in reactor assembly, reactor chamber containing nanoporous carbon powder, first porous frit, second porous frit, reactor head space, and computer processing unit.

BRODEUR C L, NAGEL C J

Manufacturing additive layer used for making particulate and particulate feedstock, involves receiving particulate at chemical vapor deposition reactor, flowing hydrocarbon gas into CVD reactor, decomposing hydrocarbon gas in CVD reactor, depositing carbonaceous coating on particulate.

SCHMIDT W R, ELWARDANY T I, SHE Y, SHARON J A