国家/地区 中国（2）
IPC部 C（2）
IPC大类 C23（2） C25（2）
IPC小类 C23C（2）
IPC C23C026/00（2）
发明人 WU J（2）
公开年
申请年
专利权人

Method for preparing composite mask plate in electronic device processing field, involves setting photo-etching pattern on mask plate, removing part of photoresist, removing remaining photoresist with cleaning solution, cleaning laser opening residue, and drying mask plate to finish preparation.

CAI J, JIANG C, ZHUANG M, WU J, ZHAO W, YAO Q

Preparation of micro-arc oxidation film-zeolitic imidazolate framework-8-graphene oxide/layered double hydroxides film on surface of magnesium alloy used e.g. for aviation, involves carrying out micro-arc oxidation, washing and drying.

WU L, CHEN Y, YAO W, WU J, PAN F