国家/地区 美国（3）
IPC部 B（3） C（3）
IPC大类 B05（3）
IPC小类 B05D（3）
IPC B82Y040/00（2） C01B031/02（2） C01B031/04（2）
发明人
公开年 2012（3）
申请年 2011（3）
专利权人

Method for preparing patterned graphene film, involves soaking substrate in acetone or photoresist peeling solution to remove photoresist or poly(methyl methacrylate) on graphene film to obtain patterned graphene film.

DAI T, YAO Q, ZHANG F

Producing graphene, comprises fixing seed crystal to support substrate, providing feedstock adjacent to seed crystal about the location, and applying laser beam to heat portion of seed crystal and portion of feedstock.

HAUCK J P

Manufacture of graphene nano belt for electric component, involves preparing single atom layer and forming layer on insulating substrate, and directly growing.

CHEN J, DING G, JIANG M, TANG S, WANG C, XIE X