国家/地区 Germany(12)
关键词 GRAPHENE(4) RESISTANCE ANISOTRO.(3) EPITAXIAL GRAPHENE(2)
GALLIUM ARSENIDE(2) GRAPHENE BUFFER LAY.(2) IIIV SEMICONDUCTOR(2)
SIC TERRACE STEP(2)
出版物 APPLIED PHYSICS LET.(4) PHYSICAL REVIEW B(2)
出版时间 2012(3) 2011(2) 2016(2)
机构 PHYS TECH BU.(12)
作者 AHLERS FJ(13)

ACS APPLIED NANO MATERIALS

PAKDEHI DM, PIERZ K, WUNDRACK S, APROJANZ J, NGUYEN TTN, DZIOMBA T, HOHLS F, BAKIN A, STOSCH R, TEGENKAMP C, AHLERS FJ, SCHUMACHER HW

ACS APPLIED MATERIALS INTERFACES

PAKDEHI DM, APROJANZ J, SINTERHAUF A, PIERZ K, KRUSKOPF M, WILLKE P, BARINGHAUS J, STOCKMANN JP, TRAEGER GA, HOHLS F, TEGENKAMP C, WENDEROTH M, AHLERS FJ, SCHUMACHER HW

APPLIED PHYSICS LETTERS

KALMBACH CC, SCHURR J, AHLERS FJ, MULLER A, NOVIKOV S, LEBEDEVA N, SATRAPINSKI A

APPLIED PHYSICS LETTERS

WOSZCZYNA M, FRIEDEMANN M, GOTZ M, PESEL E, PIERZ K, WEIMANN T, AHLERS FJ

SCIENCE TECHNOLOGY OF ADVANCED MATERIALS

FRIEDEMANN M, WOSZCZYNA M, MULLER A, WUNDRACK S, DZIOMBA T, WEIMANN T, AHLERS FJ

MICRON

SIKORA A, WOSZCZYNA M, FRIEDEMANN M, AHLERS FJ, KALBACC M

JOURNAL OF APPLIED PHYSICS

WOSZCZYNA M, FRIEDEMANN M, PIERZ K, WEIMANN T, AHLERS FJ

APPLIED PHYSICS LETTERS

WOSZCZYNA M, FRIEDEMANN M, DZIOMBA T, WEIMANN T, AHLERS FJ

APPLIED PHYSICS LETTERS

FRIEDEMANN M, PIERZ K, STOSCH R, AHLERS FJ

PHYSICAL REVIEW B

SCHURR J, KALMBACH CC, AHLERS FJ, HOHLS F, KRUSKOPF M, MULLER A, PIERZ K, BERGSTEN T, HAUG RJ