国家/地区 Germany（5）
关键词 GRAPHENE（2）
出版物 SCIENTIFIC REPORTS（3）
出版时间 2021（2）
机构 IHP（2）
作者 FRASCHKE M（7）

Processing and integration of graphene in a 200 mm wafer Si technology environment

MICROELECTRONIC ENGINEERING

LISKER M, LUKOSIUS M, FRASCHKE M, KITZMANN J, DABROWSKI J, FURSENKO O, KULSE P, SCHULZ K, KRUGER A, DREWS J, SCHULZE S, WOLANSKY D, SCHUBERT AM, KATZER J, STOLAREK D, COSTINA I, WOLFF A, DZIALLAS G, COCCETTI F, MAI A

Contacting graphene in a 200 mm wafer silicon technology environment

SOLIDSTATE ELECTRONICS

LISKER M, LUKOSIUS M, KITZMANN J, FRASCHKE M, WOLANSKY D, SCHULZE S, LUPINA G, MAI A

Tunable Schottky barrier and high responsivity in graphene/Sinanotip optoelectronic device

2D MATERIALS

DI BARTOLOMEO A, GIUBILEO F, LUONGO G, IEMMO L, MARTUCCIELLO N, NIU G, FRASCHKE M, SKIBITZKI O, SCHROEDER T, LUPINA G

Perfluorodecyltrichlorosilane-based seed-layer for improved chemical vapour deposition of ultrathin hafnium dioxide films on graphene

SCIENTIFIC REPORTS

KITZMANN J, GORITZ A, FRASCHKE M, LUKOSIUS M, WENGER C, WOLFF A, LUPINA G

Graphene based electron field emitter

JOURNAL OF VACUUM SCIENCE TECHNOLOGY B

WENGER C, KITZMANN J, WOLFF A, FRASCHKE M, WALCZYK C, LUPINA G, MEHR W, JUNIGE M, ALBERT M, BARTHA JW

Influence of plasma treatment on SiO2/Si and Si3N4/Si substrates for large-scale transfer of graphene

SCIENTIFIC REPORTS

LUKOSE R, LISKER M, AKHTAR F, FRASCHKE M, GRABOLLA T, MAI A, LUKOSIUS M

Influence of plasma treatment on SiO2/Si and Si3N4/Si substrates for large-scale transfer of graphene (vol 11, 13111, 2021)

SCIENTIFIC REPORTS

LUKOSE R, LISKER M, AKHTAR F, FRASCHKE M, GRABOLLA T, MAI A, LUKOSIUS M