国家/地区 Usa（7）
关键词 ATOMIC LAYER DEPOSI.（2）
出版物 APPLIED PHYSICS LET.（3）
出版时间 2012（3）
机构 UNIV TEXAS DALLAS（7）
作者 KIM MJ（7）

Rapid Selective Etching of PMMA Residues from Transferred Graphene by Carbon Dioxide

JOURNAL OF PHYSICAL CHEMISTRY C

GONG C, FLORESCA HC, HINOJOS D, MCDONNELL S, QIN XY, HAO YF, JANDHYALA S, MORDI G, KIM J, COLOMBO L, RUOFF RS, KIM MJ, CHO K, WALLACE RM, CHABAL YJ

In situ studies on the shrinkage and expansion of graphene nanopores under electron beam irradiation at temperatures in the range of 400-1200 degrees C

CARBON

LU N, WANG JG, FLORESCA HC, KIM MJ

Low-kappa organic layer as a top gate dielectric for graphene field effect transistors

APPLIED PHYSICS LETTERS

MORDI G, JANDHYALA S, FLORESCA C, MCDONNELL S, KIM MJ, WALLACE RM, COLOMBO L, KIM J

Atomic Layer Deposition of Dielectrics on Graphene Using Reversibly Physisorbed Ozone

ACS NANO

JANDHYALA S, MORDI G, LEE B, LEE G, FLORESCA C, CHA PR, AHN J, WALLACE RM, CHABAL YJ, KIM MJ, COLOMBO L, CHO K, KIM J

Characteristics of high-k Al2O3 dielectric using ozone-based atomic layer deposition for dual-gated graphene devices

APPLIED PHYSICS LETTERS

LEE B, MORDI G, KIM MJ, CHABAL YJ, VOGEL EM, WALLACE RM, CHO KJ, COLOMBO L, KIM J

High Resolution TEM and Electron Diffraction Study of Graphene Layers

MICROSCOPY MICROANALYSIS

SUH YJ, PARK SY, KIM MJ

Conformal Al2O3 dielectric layer deposited by atomic layer deposition for graphene-based nanoelectronics

APPLIED PHYSICS LETTERS

LEE BK, PARK SY, KIM HC, CHO K, VOGEL EM, KIM MJ, WALLACE RM, KIM JY