国家/地区 Usa(26)
关键词 CONTACT RESISTANCE(26)
出版物 APPLIED PHYSICS LET.(5) IEEE ELECTRON DEVIC.(4) ACS APPLIED MATERIA.(2)
ACS NANO(2) IEEE TRANSACTIONS O.(2) SOLID STATE COMMUNI.(2)
出版时间 2012(5) 2011(4) 2010(3) 2017(3) 2009(2) 2020(2) 2022(2)
机构 UNIV CALIF S.(3) IBM CORP(2) STANFORD UNI.(2) UNIV DELAWAR.(2)
作者 BANERJEE K(3) BOL AA(2) COLOMBO L(2) FRANKLIN AD(2)
GASKILL DK(2) HAN SJ(2) KHATAMI Y(2) LI H(2)
MYERSWARD RL(2) NATH A(2) RAO MV(2) VENUGOPAL A(2)
VOGEL EM(2) XU C(2)

IEEE ELECTRON DEVICE LETTERS

VAZIRI S, CHEN V, CAI LL, JIANG Y, CHEN ME, GRADY RW, ZHENG XL, POP E

ACS APPLIED MATERIALS INTERFACES

SOMAN A, BURKE RA, LI Q, VALENTIN MD, LI TT, MAO D, DUBEY M, GU TY

MICROMACHINES

MELCHER JL, ELASSY KS, ORDONEZ RC, HAYASHI C, OHTA AT, GARMIRE D

NANOTECHNOLOGY

FREEDY KM, GIRI A, FOLEY BM, BARONE MR, HOPKINS PE, MCDONNELL S

IEEE TRANSACTIONS ON ELECTRON DEVICES

KHATAMI Y, LI H, XU C, BANERJEE K

IEEE TRANSACTIONS ON ELECTRON DEVICES

KHATAMI Y, LI H, XU C, BANERJEE K

SOLID STATE COMMUNICATIONS

VENUGOPAL A, COLOMBO L, VOGEL EM

APPLIED PHYSICS LETTERS

SEOL G, GUO J

IEEE ELECTRON DEVICE LETTERS

FRANKLIN AD, HAN SJ, BOL AA, PEREBEINOS V