国家/地区 Netherlands（6）
关键词 EXTREME ULTRAVIOLET.（2） HYDROGEN（2） WATER（2）
出版物 APPLIED SURFACE SCI.（3） JOURNAL OF APPLIED .（2）
出版时间 2014（2）
机构 FOM DUTCH IN.（3） UNIV TWENTE（3）
作者 LEE CJ（6）

Etching processes of transferred and non-transferred multi-layer graphene in the presence of extreme UV, H2O and H-2

APPLIED SURFACE SCIENCE

MUND BK, STURM JM, VAN DEN BELD WTE, LEE CJ, BIJKERK F

Atomic H diffusion and C etching in multilayer graphene monitored using a Y based optical sensor

JOURNAL OF VACUUM SCIENCE TECHNOLOGY B

MUND BK, SOROKA O, STURM JM, VAN DEN BELD WTE, LEE CJ, BIJKERK F

Aromatic structure degradation of single layer graphene on an amorphous silicon substrate in the presence of water, hydrogen and Extreme Ultraviolet light

APPLIED SURFACE SCIENCE

MUND BK, STURM JM, LEE CJ, BIJKERK F

Defect formation in single layer graphene under extreme ultraviolet irradiation

APPLIED SURFACE SCIENCE

GAO A, ZOETHOUT E, STURM JM, LEE CJ, BIJKERK F

Graphene defect formation by extreme ultraviolet generated photoelectrons

JOURNAL OF APPLIED PHYSICS

GAO A, LEE CJ, BIJKERK F

Extreme ultraviolet induced defects on few-layer graphene

JOURNAL OF APPLIED PHYSICS

GAO A, RIZO PJ, ZOETHOUT E, SCACCABAROZZI L, LEE CJ, BANINE V, BIJKERK F