国家/地区 Usa(20)
关键词 GRAPHENE(8) EPITAXIAL GRAPHENE(2) EPITAXIAL LAYER(2)
HALL EFFECT(2) NUCLEATION(2) SI MOSFET(2)
SIC(2) TRANSISTOR(2)
出版物 APPLIED PHYSICS LET.(7) NANO LETTERS(5) IEEE ELECTRON DEVIC.(3)
JOURNAL OF APPLIED .(3)
出版时间 2010(7) 2011(6) 2009(4) 2012(2)
机构 USN(7) GEORGIA INST.(2) HRL LABS LLC(2) IBM CORP(2)
PENN STATE U.(2)
作者 TEDESCO JL(20)

SCIENTIFIC REPORTS

ELLIS CT, STIER AV, KIM MH, TISCHLER JG, GLASER ER, MYERSWARD RL, TEDESCO JL, EDDY CR, GASKILL DK, CERNE J

JOURNAL OF APPLIED PHYSICS

SIDOROV AN, GASKILL K, NARDELLI MB, TEDESCO JL, MYERSWARD RL, EDDY CR, JAYASEKERA T, KIM KW, JAYASINGHA R, SHEREHIY A, STALLARD R, SUMANASEKERA GU

JOURNAL OF APPLIED PHYSICS

SIDOROV AN, GASKILL K, NARDELLI MB, TEDESCO JL, MYERSWARD RL, EDDY CR, JAYASEKERA T, KIM KW, JAYASINGHA R, SHEREHIY A, STALLARD R, SUMANASEKERA GU

IEEE ELECTRON DEVICE LETTERS

LIN YM, FARMER DB, JENKINS KA, WU YQ, TEDESCO JL, MYERSWARD RL, EDDY CR, GASKILL DK, DIMITRAKOPOULOS C, AVOURIS P

APPLIED PHYSICS LETTERS

PULS CP, STALEY NE, MOON JS, ROBINSON JA, CAMPBELL PM, TEDESCO JL, MYERSWARD RL, EDDY CR, GASKILL DK, LIU Y

JOURNAL OF APPLIED PHYSICS

GARCES NY, WHEELER VD, HITE JK, JERNIGAN GG, TEDESCO JL, NEPAL N, EDDY CR, GASKILL DK

APPLIED PHYSICS LETTERS

CURTIN AE, FUHRER MS, TEDESCO JL, MYERSWARD RL, EDDY CR, GASKILL DK

NANO LETTERS

HITE JK, TWIGG ME, TEDESCO JL, FRIEDMAN AL, MYERSWARD RL, EDDY CR, GASKILL DK

APPLIED PHYSICS LETTERS

HOFMANN T, BOOSALIS A, KUHNE P, HERZINGER CM, WOOLLAM JA, GASKILL DK, TEDESCO JL, SCHUBERT M

NANO LETTERS

FRIEDMAN AL, TEDESCO JL, CAMPBELL PM, CULBERTSON JC, AIFER E, PERKINS FK, MYERSWARD RL, HITE JK, EDDY CR, JERNIGAN GG, GASKILL DK