国家/地区 Usa(25)
关键词 GRAPHENE(7) ATOMIC LAYER DEPOSI.(3) XRAY PHOTOELECTRON .(3)
CHEMICAL VAPOR DEPO.(2) DOPING(2) MOBILITY(2)
RAMAN SPECTROSCOPY(2)
出版物 APPLIED PHYSICS LET.(6) ACS NANO(4) JOURNAL OF PHYSICAL.(3)
ACS APPLIED MATERIA.(2)
出版时间 2012(6) 2011(3) 2013(3) 2014(3) 2016(3) 2010(2) 2015(2)
机构 UNIV TEXAS D.(14) PENN STATE U.(3) UNIV TEXAS A.(3)
作者 WALLACE RM(25)

APL MATERIALS

LIN Z, LEI Y, SUBRAMANIAN S, BRIGGS N, WANG YX, LO CL, YALON E, LLOYD D, WU SF, KOSKI K, CLARK R, DAS S, WALLACE RM, KUECH T, BUNCH JS, LI XQ, CHEN ZH, POP E, CRESPI VH, ROBINSON JA, TERRONES M

APPLIED SURFACE SCIENCE

MCDONNELL S, AZCATL A, MORDI G, FLORESCA C, PIRKLE A, COLOMBO L, KIM J, KIM M, WALLACE RM

IEEE ELECTRON DEVICE LETTERS

PARK S, LEE S, MORDI G, JANDHYALA S, HA MW, LEE JS, COLOMBO L, WALLACE RM, LEE BH, KIM J

ACS NANO

GONG C, MCDONNELL S, QIN XY, AZCATL A, DONG H, CHABAL YJ, CHO K, WALLACE RM

JOURNAL OF PHYSICAL CHEMISTRY C

GONG C, FLORESCA HC, HINOJOS D, MCDONNELL S, QIN XY, HAO YF, JANDHYALA S, MORDI G, KIM J, COLOMBO L, RUOFF RS, KIM MJ, CHO K, WALLACE RM, CHABAL YJ

APPLIED PHYSICS LETTERS

HEMANI GK, VANDENBERGHE WG, BRENNAN B, CHABAL YJ, WALKER AV, WALLACE RM, QUEVEDOLOPEZ M, FISCHETTI MV

PROCEEDINGS OF THE IEEE

COLOMBO L, WALLACE RM, RUOFF RS

JOURNAL OF PHYSICAL CHEMISTRY C

TAO L, LEE J, HOLT M, CHOU H, MCDONNELL SJ, FERRER DA, BABENCO MG, WALLACE RM, BANERJEE SK, RUOFF RS, AKINWANDE D

ENERGY ENVIRONMENTAL SCIENCE

ZHANG LL, ZHAO X, JI HX, STOLLER MD, LAI LF, MURALI S, MCDONNELL S, CLEVEGER B, WALLACE RM, RUOFF RS

ACS NANO

GONG C, HINOJOS D, WANG WC, NIJEM N, SHAN B, WALLACE RM, CHO KJ, CHABAL YJ