国家/地区 | Usa(5) |
关键词 | CONTACT RESISTANCE(8) |
出版物 | APPLIED PHYSICS LETTERS(8) |
出版时间 | 2009(3) 2010(2) |
机构 | |
作者 |
APPLIED PHYSICS LETTERS
SEOL G, GUO J
APPLIED PHYSICS LETTERS
PARRISH KN, AKINWANDE D
APPLIED PHYSICS LETTERS
FARMER DB, LIN YM, AVOURIS P
APPLIED PHYSICS LETTERS
VENUGOPAL A, COLOMBO L, VOGEL EM
APPLIED PHYSICS LETTERS
UNARUNOTAI S, MURATA Y, CHIALVO CE, KIM HS, MACLAREN S, MASON N, PETROV I, ROGERS JA
APPLIED PHYSICS LETTERS
KI DK, JO S, LEE HJ
APPLIED PHYSICS LETTERS
RAN QS, GAO MZ, GUAN XM, WANG Y, YU ZP
APPLIED PHYSICS LETTERS
GIESBERS AJM, RIETVELD G, HOUTZAGER E, ZEITLER U, YANG R, NOVOSELOV KS, GEIM AK, MAAN JC