国家/地区 日本（4）
IPC部 B（4）
IPC大类 C01（4）
IPC小类 C01B（4）
IPC C01B032/186（3） B82Y040/00（2） H01L029/786（2）
H01L031/08（2）
发明人 HAYASHI K（3） KONDO O（2）
公开年 2022（2） 2023（2）
申请年 2021（4）
专利权人 FUJITSU LTD（4）

Manufacturing optical device by forming resist of predetermined shape on multilayer graphene, and processing multilayer graphene together with resist, removing resist covering, and providing electrode covering exposed inclined end face of multilayer graphene.

KONDO D, HAYASHI K, ASO H

Producing multilayer graphene, involves synthesizing multilayer graphene from carbon source using iron-chromium alloy film as catalyst.

HAYASHI K, KONDO O

Producing multilayer graphene involves recrystallizing catalyst film by performing heat treatment of heating catalyst film containing iron and nickel in atmosphere containing hydrogen, and another atmosphere containing hydrogen and hydrocarbons to form stacked graphenes.

HAYASHI K

Optical element comprises substrate, multilayer graphene provided on substrate, electrode connected to multilayer graphene, and another electrode connected to multilayer graphene.

KONDO O