国家/地区 中国（3） 印度（2）
IPC部 G（5）
IPC大类 G03（5）
IPC小类 G03F（5） C01B（2） H01G（2）
IPC G03F007/20（3） G03F007/30（2） H01G011/36（2）
发明人
公开年 2023（5）
申请年 2023（5）
专利权人

Synthesisizing nickel-manganese-sulfur decorated reduced graphene oxide nanocomposite for ultra-fast photocatalytic degradation of organic dyes, involves adding manganese chloride tetrahydrate into stirring solution and treating homogeneous suspension with cetyltrimethyl ammonium bromide.

SASIPRABA T, GOVINDHASAMY M

Method for preparing carbonaceous insulating layer of electron beam induced photoresist growth, involves utilizing organic solution to clean substrate by electron beam and wash photoresist solid film, and forming carbonaceous insulating layer after leaving electron beam irradiation under substrate.

HAO L, LI R, YU K, TIAN H, MA L

Method for preparing graphene sub-nanoscale gap by feedback control electric breakdown, involves stopping voltage to apply to two ends of single-layer graphene nanoribbon when resistance of single-layer graphene nanoribbon reaches preset resistance to construct and obtain graphene sub-nanoscale gap.

SU M, HONG W, LIU J, ZHANG C, YUAN Z

Supercapacitor-battery hybrid energy system used for electric vehicle, comprises lithium-ion battery, and carbon-graphene supercapacitor connected to lithiumion battery, to increase efficiency of lithium-ion battery, where carbon-graphene supercapacitor comprises first layer, second layer.

GULLIPALLI A, SAMANA D L, VISSAKODETI B L, ANDE V P, IMMANDI B H, BATTU Y, KUMAR R S, KUMAR M, PERICHARLA S R

Preparation graphene of microstructure involves spin coating SU-8 photoresist on surface of silicon chip by spin coater, and preparing patterned SU-eight photoresists microstructure by using photo-etching technique and electron beam irradiation.

ZHOU S, NIU Y, CHOU X, BI K, LI Q, MEI L