国家/地区 世界知识产权组织（7） 欧洲专利局（EPO）（6） 法国（4） 美国（2）
IPC部 C（4） B（3） H（2）
IPC大类 B29（2） B33（2） C08（2）
H01（2）
IPC小类 B29C（2） B33Y（2）
IPC B33Y010/00（2） B33Y070/00（2）
发明人
公开年 2021（5） 2022（2）
申请年 2020（7）
专利权人 CENT NAT RECH SCI（7）

Aqueous drilling fluid composition used for decreasing fluid loss across wellbore, comprises xanthan gum and exfoliated two-dimensional material.

VOIRY D

Bringing polymer composition above a threshold temperature on demand by exposing the polymer composition containing heat-generating organic dye to red to near-infrared irradiation at a wavelength within red to near-infrared range.

LALEVEE J, LAUNAY V, CARON A, NOIRBENT G, DUMUR F, GIGMES D

Preparing adsorbent material on basis of at least one porous metal-organic framework (MOF) being suitable for adsorbing gases, e.g. carbon dioxide, comprises combining porous particulate MOF with particulate graphene oxide.

HEYMANS N, DE WEIRELD G, CASABANJULIAN J, HAMILL C, ZHANG Y, MOORE A, EMMERICH R, GRAF M, RESS C, SCHOENWALD M, TORIBIO B A, ZURUTUZA A, ORTEGA A, SERRE C, ALONSO B, DE W G, SCHOENWALD M

Thermosetting composite material used for three dimensional printing by extrusion, comprises a furan polymer forming a thermosetting matrix of the composite material and a a material immiscible with the thermoset matrix cissable.

BENEVENTI D, CHAUSSY D, BOUZIDI K, GANDINI A

Additive manufacturing process for forming component, involves partially coating grains of layer of metallic or ceramic powder with film of additive material, at end of deposition of layer of powder and prior to selective melting process.

MINEA T, WALRAND G, EFFERNELLI A, CRESPI A E

Radiating element for antenna used in avionics and aerospace, high-speed communication, which has set of wire nanostructure, where wire nanostructure is carbon nanotube and, inductor is connected to each first end of nanostructure.

CHAZELAS J, TRIPONCANSELIET C, ZIAEI A, XAVIER S, JEAN C, CHARLOTTE T, AFSHIN Z, STEPHANE X

Method for manufacturing device for use in electronics and biomolecule detection, involves depositing second resin layer of lithography on preserving area of first lithography, without removing first resin layer.

BOCKELMANN U, MENSAH K