国家/地区 韩国（4） 美国（3）
IPC部 C（3） G（3） B（2）
H（2）
IPC大类 C01（3） G03（3） B01（2）
IPC小类 C01B（3） G03F（3） B01J（2）
IPC G03F001/22（3） G03F001/62（3） C01B032/184（2）
G03F001/64（2） G03F007/20（2）
发明人 CHO J W（4）
公开年 2022（2）
申请年 2022（2） 
专利权人 KOREA ELECTRONICS TECHNOLOGY INST（4）

Performing low-temperature direct growth method of multilayer graphene for manufacturing pellicle for extreme ultraviolet lithography, involves forming etch stopper on substrate, and forming seed layer on etch stopper, where seed layer is selected from boron nitride, or boron carbon nitride.

KIM H Y, CHO J W, KIM H M, KIM S G, KIM H K, KIM H, MI K H, KIM S K

Pellicle i.e. consumable component for protecting mask from contaminants in lithography process for semiconductor or display manufacturing, has substrate whose central portion is formed with opening, and pellicle layer containing amorphous carbon and core layer, formed on support layer.

KIM H Y, CHO J W, KIM H M, KIM S G, KIM H K, KIM H, MI K H, KIM S K, JEONJUNHYUCK, LEE S M

Preparing pellicle for extreme UV exposure with graphene defect healing layer, involves forming support layer of silicon nitride material on silicon substrate, and forming core layer of graphene material on support layer.

KIMHYUNGKEUN, MI K H, LEE W S, YANG H S, JOJINWOO, KIM B, JEONJUNHYUCK, LEE G H, KIM H Y, JEON J H, KIM S G, CHO J W, KIM H M, KIM H K

Exothermic composition useful for heating element, comprises mixed binder obtained by mixing e.g. epoxy acrylate, partially graphitized graphene oxide particles, conductive particles, organic solvent and dispersing agent.

JIN W C, YOONJIN K, CHO J W, KIM Y