国家/地区 欧洲专利局（EPO）（4）
IPC部 C（3） B（2）
IPC大类 C01（3） B82（2）
IPC小类 C01B（3） B82Y（2）
IPC B82Y040/00（2） C01B031/04（2）
发明人 STRUPINSKI W（4）
公开年
申请年 2016（3） 
专利权人 MATERIALOW E.（4）

Analyzing method of solid substrate by secondary ion mass spectroscopy (SIMS), involves detecting and analyzing ejected secondary anions by mass spectrometry analysis, after sputtering graphene-coated substrate in dynamic mode SIMS (dSIMS).

MICHALOWSKI P, STRUPINSKI W, KASZUB W

Passivation of graphene in graphene-based device involves depositing graphene layer on dielectric support and pre-heating graphene-based device under vacuum conditions, in which graphene surface is covered with silicone layer.

CIUK T, STRUPINSKI W

Production of graphene foil with pre-defined number of graphene layers involves producing graphene on metallic substrate, depositing polymer layer on graphene surface, and separating polymer/graphene stack from substrate.

KRAJEWSKA A, PASTERNAK I, PRZEWLOKA A, STRUPINSKI W

Manufacturing graphene, comprises performing vapor phase epitaxy on substrate comprising silicon carbide surface, and controlling sublimation of silicon from the substrate by flow of e.g. inert gas (argon) through epitaxial reactor.

STRUPINSKI W, STRUPIAFSKI W, STRUPINSKI W O