国家/地区 美国（3）
IPC部 B（3）
IPC大类 C01（3） B01（2） B82（2）
C23（2）
IPC小类 C01B（3）
IPC C01B031/04（3）
发明人 WANG C（3）
公开年
申请年
专利权人

Method for modifying e.g. I-V characteristics, of graphene i.e. semiconductor film, involves placing graphene film in vacuum environment, and radiating graphene film with electron beam to obtain graphene material.

HUANG C, CHU C, CHIU S, WANG C, WEI C, CHUNG C, WU B, HUANG J, QIU S, WANG J, ZHU J, WEI J, ZHONG C, HUANG C H, CHU C W, CHIU S M, WANG C C, WEI C M, CHUNG C J, WU B H

Fabricating graphene comprises inserting first electrode that is graphite multilayer material and second electrode into electrolyte without contacting, producing potential difference and permitting liquid to enter into first electrode layer.

LING Y, WANG C, LIU J, LING Y C, WANG C P, LIU J Y

Manufacture of graphene nano belt for electric component, involves preparing single atom layer and forming layer on insulating substrate, and directly growing.

CHEN J, DING G, JIANG M, TANG S, WANG C, XIE X