国家/地区 中国（7）
IPC部 C（7）
IPC大类 C08（3） C01（2）
IPC小类 C08K（3） C08L（3） C01B（2）
IPC C08K003/04（3） C08L023/08（2）
发明人 WEI C（7）
公开年 2018（7）
申请年 2017（4）  2018（3） 
专利权人 13TH RES INS.（2） WUHU CHUANGK.（2）

Anti-impact polystyrene material useful in energy automobile, comprises e.g. high-impact polystyrene resin, acrylated epoxy resin, polyurethane elastomer, modified fiber, graphene oxide, isophorone diisocyanate and toughening agent.

ZHUANG L, HUANG X, WANG J, WEI C

High hardness-scratch resistant modified polyvinyl chloride material comprises e.g. polyvinyl chloride resin, polymethyl methacrylate, graphene, organic coated metal powder, polyolefin elastomer, compatibilizer and toughening agent.

LI K, WANG J, WEI C, HUANG X

Preparation of composite photocatalyst comprises mixing tetrabutyl titanate and anhydrous ethanol, adding graphene dispersion, mixing, cooling, gradually adding nitric acid aqueous solution, and continuously stirring.

WEI C, YAO Z, ZHANG Q, LI J

Preparing single-layer graphene on the surface of ultra-nano diamond comprises pre-processing ultra-nano-diamond film for removing surface impurities and surface stress, forming metal layer and subjecting to high temperature annealing.

GUO J, WEI C, FENG Z, FANG Y, HE Z, WANG J, LIU Q, ZHOU C, GAO X

Flexible flame-retardant graphene phase change composite material used for manufacturing electronic devices, comprises graphene oxide solution and flame retardant phase change material that comprises 4,4'-diphenylmethane diisocyanate.

HONG W, JIAO T, SUN J, ZHAO X, WEI C, GAO J, WU S, ZHANG C, ZHANG B, TIAN H, ZHANG H, MI F

Silicon carbide composite ceramic comprises silicon carbide powder I, silicon carbide powder II, graphene nanosheet, charcoal black, silicon powder, dispersing agent and binding agent.

LI S, WEI C, LIU A, MENG Z, ZHANG Q

Modified chemical vapor deposition for preparing uniform graphene material, involves selecting silicon carbide substrate, cleaning, drying, vacuumizing, turning on microwave power, heating and removing gas adsorbed on surface substrate.

LIU Q, WEI C, HE Z, WANG J, GUO J, ZHOU C, FENG Z, YU C