国家/地区 中国（13）
IPC部 C（7） B（4） H（3）
IPC大类 C01（5） B01（3） H01（3）
IPC小类 C01B（4） B01J（2） H01G（2）
IPC H01G009/20（2）
发明人 ZHENG X（13）
公开年 2016（8） 2017（5）
申请年 2016（13）
专利权人 WUHAN SANXUA.（2）

Dye-sensitized solar cell, has porous graphene layer adhered between platinum layer and working electrode, and electrolyte placed between working electrode and composite electrode, where size of graphene hollow hole is specific value.

ZHENG X, WU D, YAN M

Dye-sensitized solar cell, has composite electrode formed with platinum layer and porous graphene layer, porous graphene layer formed on platinum layer, where electrolyte is filled between working electrode and composite electrode.

ZHENG X, WU D, YAN M

Graphene manufacturing device comprises a soaking oxidation device and an accelerating device, where soaking oxidation device has a cylindrical oxidation kettle that is connected with a stirring device.

ZHENG X, MA Y

Ultra-high molecular weight polyethylene composite material is obtained by blending graphene with ultra-high molecular weight polyethylene under high impact air flow.

DU H, ZHENG X, CHU X, CHEN W, YOU C, HE Y, LV W, LI B, YANG Q, KANG F

Preparation of graphene oxide by putting graphite powder into first container filled with mixed acid solution, placing in ice water bath, stirring to obtain black suspension, adding potassium permanganate powder, heating and stirring.

ZHANG J, LIU Y, FU X, LIU M, ZHENG X, HUANG M, LI Z

Breeding silkworm, by adding carbon nanotube or graphene quantum dot to silkworm artificial feed or silkworm feed, absorbing silkworm, feeding silkworms with common feed, and feeding modified feed.

ZHANG Y, ZHENG X, SHAO H, ZHAO M, WANG D, HU X

Magnesium hydride compound powder comprises magnesium powder, graphite, graphene, and antioxidant.

CHENG Y, ZHENG X, ZHOU H, WU H

Preparing nano molybdenum disulfide by graphene template-induced growth, comprises, e.g. reacting graphene, citric acid, sodium molybdate and sodium sulfide, carrying out ultrasonic treatment, adjusting pH, and calcining obtained precursor.

XU Y, GENG J, ZHENG X, HU X

Photo-resist graphene removing method, involves forming silicon nitride layer on photo-resist graphene part, performing photo-resist acetone leaching part removing process, and performing photo-resist graphene removing process.

DI Z, JIA P, MA J, WANG G, WANG X, XUE Z, ZHANG M, ZHENG X

Use of hybrid antibacterial agent in modified ultrafiltration membranes, where modified ultrafiltration membrane comprises hybrid antimicrobial agent and silver nanoparticles stably anchored on oxide layer of graphene sheet.

CHEN G, JIANG F, SHEN Q, WU Q, XU Z, YE J, YU J, ZHENG X, XU S, ZHU W, SUN W, DI Z, GUI M