国家/地区 中国（5）
IPC部 G（4） C（3）
IPC大类 G03（4） C09（2）
IPC小类 G03F（4） C09K（2）
IPC G03F007/004（3） C09K011/02（2） C09K011/65（2）
G03F007/027（2） G03F007/20（2）
发明人 ZOU Y（5）
公开年 2017（2）
申请年 2017（3）  2022（2） 
专利权人 UNIV BEIJING NORMAL（5）

Preparing photoresist-graphene conductive composite system used in e.g. sensor conductive line and capacitor, involves providing mixture comprising graphene and photoresist, coating mixture on substrate, and then drying to prepare film, and then using mask pattern plate to expose obtained film.

XIN Y, WANG J, PANG Y, YI M, ZOU Y

Preparing luminescent composite system of photoresist-reduced carbon quantum dots useful in e.g. electroluminescent electronic device and drug delivery, comprises e.g. carrying out solvent dispersion of carbon quantum dots and dispersing in ionic liquid, and mixing with photoresist.

XIN Y, YI M, PANG Y, WANG J, ZOU Y

Preparing photoresist-reduced graphene oxide composite conductive material comprises taking mixture of graphene oxide, photoinitiator and photoresist and irradiating the mixture under ultraviolet light.

ZOU Y, XUE B

Preparing photoresist-graphene quantum dot light emitting composite system comprises e.g. providing mixture containing graphene quantum dot and photoresist, exposing the mixture using mask pattern and removing uncrosslinked part.

ZOU Y, XUE B

Manufacture of photoresist-graphene composite material for e.g. micro-sensor, involves exposing mixture comprising graphene material and photoresist using mask pattern, and treating with developing solution to remove uncrosslinked portions.

ZOU Y, XUE B