国家/地区 日本（6）
IPC部 C（6）
IPC大类 C01（6）
IPC小类 C01B（6） C07C（5） C08G（3）
B82Y（2） C07B（2） C07D（2）
C07F（2）
IPC C01B032/182（6）
发明人 DUMSLAFF T（2） FASEL R（2） FENG X（2）
ISHIDA S（2） ITAMI K（2） ITO H（2）
MATSUSHIMA K（2） MUELLEN K（2） MULLEN K（2）
NAKATSUJI H（2） RUFFIEUX P（2） SCHWAB M G（2）
公开年 2015（4）
申请年 2015（2） 
专利权人 BASF SE（2） MAX PLANCK G.（2） TAOKA CHEM C.（2） UNIV TOKAI N.（2）

New graphene nanoribbon used for semiconductor, solar cell, transparent electrode, high-speed transistor and organic electroluminescent device.

ITAMI K, ITO H, MATSUSHIMA K, NAKATSUJI H, UENO R, ISHIDA S, OKUDA S

Manufacture of naphthyl silole compound used for preparing graphene nanoribbons, involves reacting brominated/iodinated biphenyl compound with lanthanoid-and-lithium-containing ate complex, and reacting obtained lanthanoid complex with silyl compound.

ITAMI K, ITO H, MATSUSHIMA K, MURAKAMI K, NAKATSUJI H, ISHIDA S

New ortho-terphenyl derivatives used for preparing graphene nanoribbons for thin film semiconductor for use in optical device, such as organic field effect transistor device, organic photovoltaic device or organic light-emitting diode.

SCHWAB M G, MULLEN K, FENG X, DUMSLAFF T, RUFFIEUX P, FASEL R, MUELLEN K

Graphene composite useful in conductive additive and paste which is useful in electrode for lithium ion batteries, includes a graphene powder and a compound having a structure of pyrazolone.

DU N, WANG J, SUN P, TAMAKI E, KUBOTA Y, MIYAZONO K, KUBOTA, MIYASONO T

Graphene nanoribbon comprises repeating unit comprising edge carbons which can unambiguously be assigned as zigzag or cove type carbon atoms.

SCHWAB M G, MUELLEN K, FENG X, YANG B, DUMSLAFF T, FASEL R, RUFFIEUX P, LIU J, CAI J, SANCHEZSANCHEZ C, MULLEN K, SANCHEZ S C, TSAI J, MILLEN K

Manufacture of functionalized graphene used for e.g. barrier material, involves forming mixture using graphite oxide, solvent and functionalized compound containing sulfur and amino group, reacting, and recovering resultant graphene.

LEE J S, DO SEUNG H, JEON S Y, HAN G W, KONG J H, DO S H, LEE J, DO S, JEON S, HAN G, KONG J