国家/地区 韩国（6）
IPC部 C（6）
IPC大类 C23（6） H01（5） C01（3）
IPC小类 C23C（6） H01M（4） C01B（3）
IPC C23C016/44（6）
发明人 CHUNG J H（2） HEE L（2） HYUN L J（2）
IMSUNGWOO（2） JEON Y M（2） LEE H S（2）
LIM H H（2） LIM J（2） LIM J C（2）
LIM S W（2） PARK G（2） PARK G O（2）
PARK J G（2） YOO S K（2） YU S（2）
公开年 2022（6）
申请年 2021（5） 
专利权人 DAEJOO ELECT.（2） SK ON CO LTD（2）

Apparatus for depositing two-dimensional material, comprises planar high-frequency antenna formed on second surface of dielectric window, and first gas nozzle configured to provide source gas into chamber.

SHIN H, SHIN K, LEE C, LEE C S, SHIN K W, SHIN H J

Depositing thin film, comprises preparing mixture of cyclohexanone and graphene oxide, supplying the mixture into chamber, and depositing thin film using plasma enhanced chemical vapor deposition by providing radio frequency power.

YOON S Y, YOOK J, JAI L H, SHIM W P

Active material used in negative electrode for lithium secondary battery, comprises pores having preset size, and silicon-based compound having preset ratio of peak intensity in region having specific wavelength in Raman spectrum.

PARK G O, YOO S K, CHUNG J H, ZHENG Z, YU S, PARK G

Cathode active material e.g. for lithium secondary battery, comprises e.g. silicon-containing coating layer formed inside pores or on surfaces of carbon-based particles, and carbon coating layer formed on silicon-containing coating layer.

PARK G O, YOO S K, JANGDONGIL, CHUNG J H, JANG D I, ZHENG Z, ZHANG D, YU S, PARK G

Porous silicon-carbon composite used for negative electrode active material for lithium secondary battery, comprises silicon particles, magnesium fluoride, and carbon.

LIM J C, LEE J, JEON Y M, LIM S W, PARK J G, LEE H S, LIM H H, NAM S J, LEE E, LIM J, HYUN L J, IMSUNGWOO, HEE L, JIN N, PARK S

Porous silicon-based carbon composite used for forming negative electrode active material, comprises silicon particles capable of intercalating and de-intercalating lithium, magnesium compound, and carbon, and has preset molar ratio of magnesium atoms with respect to silicon atoms.

PARK J G, LEE H S, JEON Y M, OH S M, PARK H S, LIM S W, LIM H H, LIM J C, LEE J H, HUNSOO P, IMSUNGWOO, HEE L, LIM J, HYUN L J