国家/地区 中国（3）
IPC部 H（3）
IPC大类 H01（3）
IPC小类 H01J（3）
IPC H01J037/32（3）
发明人 CHOI S M（2） CUI S（2） JANG D Y（2）
JEON M（2） JEON M S（2） JIN R（2）
JUNMINSUNG（2） KIM Y S（2） MIN C S（2）
ZHANG D（2）
公开年 2023（3）
申请年 2022（2） 
专利权人 SEMES CO LTD（2）

Graphene processing device for providing low energy injection ion for use in e.g. biological medicine application, has upper electrode net and the lower electrode net through which plasma generated by plasma coil discharge passes so as to process sample located on sample seat in processing chamber.

WANG W, JIANG C, WANG Y, WANG H

Substrate treating apparatus for treating substrate using plasma, has chamber having treating space, support unit positioned within treating space and configured to support substrate, and plasma generation unit configured to generate plasma from process gas supplied to the treating space.

JANG D Y, CHOI S M, KIM Y S, JEON M S, JUNMINSUNG, MIN C S, ZHANG D, CUI S, JIN R, JEON M

Substrate treating apparatus, has plasma generation unit comprising bottom electrode and top electrode opposite bottom electrode, where top electrode comprises plate and electrode layer on plate.

JIN Y J, KIM J H, JANG D Y, CHOI S M, KIM Y S, JEON M S, JUNMINSUNG, MIN C S, YOUNGJO J, JIN Y, KIM J, ZHANG D, CUI S, JIN R, JEON M