国家/地区 美国（6） 中国（5） 世界知识产权组织（5） 欧洲专利局（EPO）（4） 日本（3） 韩国（3） 新加坡（3） 台湾（2）
IPC部 B（7）
IPC大类 C01（7）
IPC小类 C01B（7）
IPC B82Y040/00（6） C01B031/04（6） B82Y030/00（5）
C01B031/02（3） C01B032/194（3） C01B032/182（2）
C01B032/186（2） C01B032/23（2）
发明人
公开年 2013（7）
申请年 2013（7）
专利权人

Preparing porous graphene oxide material used as catalyst, comprises preparing graphene oxide sheets, heating graphene oxide suspension containing sheets with base and heating mixture of base-treated graphene oxide sheets and acid.

LOH K P, SU C L

New bipyridine ruthenium complex covalently-functionalized graphene photocatalyst used for photocatalytic decomposition of water to produce hydrogen.

XIAO B, YANG P, DU Y, MOU Z

Graphene nanoribbon used for e.g. spintronic device, contains repeating unit having modification(s) chosen from heteroatomic substitution, vacancy, stone-wales defect, inverse stone-wales defect, and hybridized carbon network.

FASEL R, RUFFIEUX P, MUELLEN K, CAI J, FENG X, BERGER R, TSAI J, CAI Y, MULLEN K, MILLEN K

New imidazolidine-type compound used for mixed ionic liquid for preparation of graphene dispersion liquid for electronic component e.g. energy storage electrical appliance and lithium-ion secondary battery.

AIDA TAKUZO, PARK CHIYOUNG, RAVI SAISUWAN, MATSUMOTO MICHIO, AIDA T, PARK C, RAVI S, MATSUMOTO M

Producing aerogel or xerogel comprising graphene, graphene oxide or its mixture involves dispersing graphene, graphene oxide or its mixture in solvent compatible to it, and cross-linking the graphene, graphene oxide or its mixture.

GALLASTEGUI A G, SHAFFER M, ALYOUBI A O, ASIRI A M, SCHAEFFER M

Method for forming film of graphene involves placing substrate in processing chamber at reduced pressure, performing surface treatment process on portion of substrate, and providing carbon-containing material in processing chamber.

BOYD D A

Graphene useful in a device including a sensor and FET, comprises an etched edge portion, where the etched edge portion comprises a functional group e.g. ketone, aldehyde and carboxylic acid.

CHOI W M, HONG B H, CHOI J