国家/地区 美国（3） 世界知识产权组织（2）
IPC部 B（3）
IPC大类 C08（3）
IPC小类 H01L（3） C08K（2） C09D（2）
IPC H01L021/02（3）
发明人
公开年 2021（3）
申请年 2020（3）
专利权人

Composition used in forming thin film, comprises chemical contrast pattern having first region of first chemistry on background of second chemistry, and microphase-separated block copolymer material overlying the chemical contrast pattern.

ARNOLD M, JACOBBERGER R, NEALEY P, XIONG S, CHANG T, MA Z, NEALEY P F

Carbon abrasive used to polish slurry, and manufacture semiconductor device contains carbon nanoparticle, and positively charged polymer, and/or positively charged oligomer disposed on surface of carbon nanoparticle.

TAKAI K, KIM D Y, KIM D

Providing electrical contact on graphene surface, for polymer-coated graphene layer structure involves e.g. providing graphene layer structure comprising graphene layers and having polymer coating on its surface.

GLASS H, GUINEY I, TYLER M, THOMAS S