国家/地区 中国（6）
IPC部 C（6）
IPC大类 C08（6）
IPC小类 H01L（6） C08K（5） B82Y（4）
C01B（4） B32B（2） B82B（2）
C08L（2）
IPC H01L021/02（6）
发明人
公开年 2015（2）
申请年 2013（2）  2015（2） 
专利权人

Carbon abrasive used to polish slurry, and manufacture semiconductor device contains carbon nanoparticle, and positively charged polymer, and/or positively charged oligomer disposed on surface of carbon nanoparticle.

TAKAI K, KIM D Y, KIM D

Use of reduced graphene oxide laminate membrane as barrier material in which reduced graphene oxide is formed from reduction of graphene oxide with reducing agent.

RAVEENDRANNAIR R, SU Y, GEIM A, RAVEENDRAN N R

Particle for particulate material used for composite material, particle dispersion and article comprises stacked sub-structures in which each sub-structure includes stack of graphene layers.

WALTERS I, WALTERS D

Composite material for manufacturing capacitor device such as memory device, capacitor, transistor or diode, comprises polymeric material and hydrazine-reduced graphene oxide.

ALMADHOUN M N, ALSHAREEF H N, BHANSALI U S, XAVIER P, ODEH I N, ALMADHOUN M, MADHOUN M, SHARIF H A, BHANSALI Y S, EXAER P

Depositing graphene onto a substrate used in polymeric composites, involves transferring solubilized graphene onto the substrate in a liquid medium, where transferring occurs by changing the solubility of graphene in the liquid medium.

PAWLOSKI A R, BENNETT G S, CERNOHOUS J J, KASKE K, SZYMANSKI A E

Making graphene nanoribbon comprises contacting poly(phenylene ethynylene) polymer, annulating compound, and catalyst system comprising metal catalyst and protic acid, and oxidizing the arylannulated polymer product.

DICHTEL W R, ARSLAN H, URIBEROMO F J