国家/地区 中国（3）
IPC部 C（3）
IPC大类 C01（3） B82（2） C23（2）
H01（2）
IPC小类 C01B（3）
IPC B82Y040/00（2） C23C028/00（2）
发明人 LEE H（3）
公开年
申请年
专利权人

Method of making a pellicle for use in extreme ultraviolet (EUV) lithography system, by depositing graphene layer over first material layer, and depositing amorphous silicon layer over graphene layer.

TU C, CHEN C, YOO C S, CHANG J, TSAI C, LIU P, LEE H, LIN C, LIN Y, TU Z, CHEN J, CAI J, YOU Q, ZHANG Z, LIN Z, LIU B, LI X, YOO C

Manufacture of graphene used in manufacture of electric device, involves contacting hydrogen gas with metal catalyst, contacting metal catalyst with hydrocarbon gas, nitrogen gas, or inert gas, and forming graphene on metal catalyst.

CHO K W, LEE H C, LEE E H, CHO K, LEE E, LEE H, LI E

Resin plating comprises forming a graphene thin layer on a resin substrate and electroplating the resin substrate having the graphene thin layer formed on it.

BAE A H, SON S I, NAM J D, LEE J H, HWANG T S, OH J S, LEE H, EAH H B, SANG I S, JAE D N, JOON S O, JUN H L, TAE S H, HWANG T, LEE J, NAN J, PAE A, SUN S, OU J