国家/地区 中国（8）
IPC部 C（8）
IPC大类 C09（8） C01（2） H05（2）
IPC小类 C09D（8）
IPC C09D011/30（8）
发明人 HUANG B（3）
公开年 2016（5） 2017（3）
申请年 2016（8）
专利权人 CHENGDU NASH.（3）

Preparing graphene conductive ink comprises mixing carbon black and graphite and grinding to obtain the composite conductive filler, taking ethanol, ethylene glycol, glycerine and de-ionized water mixing and stirring to obtain mixed solvent.

XU C, JI A, ZHOU H, ZHU N, SHI X, SHI L, ZHAO Y, GUO L, WANG X

Photocurable water-resistant ink comprises specified amount of epoxy resin, polyurethane-modified acrylic resin, pigment, carboxylic acid-modified polyester acrylate, nano-silica, photoinitiator, graphene and additive.

HUANG B

Preparing monodispersable graphene-based nano-silver complex comprises e.g. adding graphene oxide in water, carrying out ultrasonic dispersing to obtain graphene oxide dispersion liquid, adding ammonia solution for adjusting pH value.

DU Y, JIANG J, LIAO Z, YANG S, YUN W

Insect repellent light-curable ink comprises divinyl adipate, polyurethane-modified acrylic resin, pigment, graphene, garlic juice, photoinitiator, natural camphor oil and additives.

HUANG B

Wear-resistant light-curable ink comprises divinyl adipate, polyurethane-modified acrylic resin, pigment, ultra-high molecular weight polyethylene, ultra-fine aluminum silicate, photoinitiator, graphene and additives.

HUANG B

Manufacture of graphene ink used for graphene-based conductive material, involves ultrasonically-treating flaky graphite-ethyl cellulose dispersion, adding sodium chloride, centrifuging and mixing product with ethanol-terpineol solution.

WANG Z, MA Q, WANG D

Preparing high-concentrated graphene ink used in e.g. printed electronic techniques, by mixing graphite sheet and dispersing agent, subjecting mixture to ultrasonic dispersion, adding e.g. graphene powder, and centrifuging mixture.

CHEN K, CHEN S, YIN Y, WANG C, REN J

Oxidized graphene ink used in ink jet printer comprises graphene oxide, surfactant and solvent.

KANG Y, LI Y, WANG J, WANG F, YAO C, YIN Z, LI P, WANG B, CAI F, TAO C, YIN C