国家/地区 中国（7）
IPC部 C（7）
IPC大类 C09（7） C08（3）
IPC小类 C09D（7）
IPC C09D007/61（6） C09D007/63（3） C09D005/10（2）
C09D007/62（2） C09D007/65（2） C09D163/00（2）
发明人 WANG Q（7）
公开年 2021（4） 2020（3）
申请年 2020（7）
专利权人

Reduced graphene oxide/nano zirconium oxide composite material filler used for synthesizing thermosetting polyimide coating, includes reduced graphene oxide material and zirconium oxide material, where chemical bond energy is comprised between zirconium oxide and reduced graphene oxide material.

WANG Q, YANG Y, LIU H, SHI G, WANG H

Antistatic optical grade release film comprises substrate layer and release agent layer, where substrate layer is provided with antistatic layer comprising acrylic resin, dimethyl silylated silica, graphene, melamine, and ethylene glycol.

WU P, WANG Q, CHI W

Protecting fasteners of offshore power transmission towers comprises e.g. cleaning fasteners of power transmission towers, removing water and oil, removing dust and rust, uniformly spraying primer on fasteners, and applying primer coating.

LIU X, LI R, LIU Z, HE Y, JIAO P, NIE Q, LUO R, WANG Q, HOU W

Anti-leakage coating for magnetic pumps, comprises epoxy resin, aluminum tripolyphosphate, dispersant, nano-titanium oxide, composite filler, polyurethane resin, silica sol, bisphenol A and deionized water.

WU H, WU X, WU J, MENG J, WANG Q, WANG W, TANG Z, XU J

Montmorillonite graphene aqueous zinc-rich primer used in coating, comprises polymethylpentene, polymethylacrylate, organic montmorillonite clay, inorganic montmorillonite clay, epoxy curing agent, zinc powder, defoamer and graphene slurry.

REN W, WANG S, WU Z, WANG Q, ZHOU L

Graphene modified inorganic potassium silicate paint useful for preparing metal anticorrosive coating comprises e.g. high modulus potassium silicate solution, silane coupling agent, silicone acrylic emulsion, attapulgite and auxiliary agent.

LIU Z, SU W, WANG Q, ZHANG J, WANG Z, MIAO C, WEI P

Graphene-based aqueous conductive ink comprises water-soluble resin, conductive filler, dispersing agent, graphene and solvent.

WU L, ZHAO L, HE G, DU H, WANG Q