国家/地区 美国（3）
IPC部 B（3） C（3）
IPC大类 B32（3）
IPC小类 B32B（3）
IPC B32B038/10（3）
发明人 LI X（3）
公开年 2014（2）
申请年 2012（2） 
专利权人 INT BUSINESS.（3）

Electrochemical etching method used for metal substrate involves forming electrically conductive polymer on graphene layer such that metal plate is coupled to graphene layer, then disposing metal substrate layer in electrolyte.

GUO L, HAN S, LI X

Electrochemical etching method for removing metal substrate layer from graphene layer, involves connecting graphene layer or metal substrate layer to power source to supply current to etch metal substrate layer from graphene layer.

HAN S, GUO L, LI X

Apparatus for electrochemical or electroplating etching of copper foils from graphene for e.g. electronic device application, has anode including metal substrate layer etched from graphene layer in response to current flowing through anode.

HAN S, GUO L, LI X