国家/地区 台湾（7）
IPC部 C（7） B（4） H（3）
IPC大类 C01（7）
IPC小类 C01B（7）
IPC C01B031/04（7） B82Y030/00（3） B82Y040/00（3）
C01B031/02（3） C01B032/20（3） B32B009/00（2）
B32B027/06（2） C01B032/205（2） C08J007/04（2）
发明人
公开年 2014（7）
申请年 2013（3）  2012（2）  2014（2） 
专利权人 SEKISUI CHEM.（2） SEKISUI CHEM.（2）

Synthesis of nano-structured polymers containing graphene involves reacting graphite oxide containing bound oxygen dispersed in solvent by ultrasounds, with vinyl monomer and vinyl aromatic monomer, in presence of strong inorganic acid.

GOFFREDI G, LONGO A, VALENTINO O, FELISARI R, CASALINI A

Manufacture of flaky graphite used for forming flaky graphite-resin composite, involves immersing carbon material having graphene laminated structure in liquid, irradiating electromagnetic waves, heating and slicing carbon material.

INUI N

New oligophenylene monomer useful in polymeric precursor for preparing graphene nanoribbons that used are in thin film semiconductor of electronic, optical, or optoelectronic device e.g. organic field effect transistor device.

MUELLEN K, FENG X, CAI J, RUFFIEUX P, FASEL R, NARITA A, TSAI J, MULLEN K, MILLEN K

Thermal radiation film for e.g. electronic devices comprises heat-transfer layer formed by uniformly dispersed graphene microparticles and carbon nanotube.

KAGAWA S, SEIJI K

Hybrid material, useful as a fluorescence marker, an attacking drug in photodynamic therapy to treat cancer, imaging agent and a drug delivery system, comprises hydroxyl-terminated poly(amidoamine) dendrimer, folic acid and graphene oxide.

IMAE T, SIRIVIRIYANUN A

Composite material comprises graphene-type carbon layer comprising graphite-type carbon material obtained by thermally decomposing polymer within composition, provided on base material containing resin.

FUKUDA R, IHARA H, NAKASUGA A, NOZATO S, TAKAFUJI M, GANAPATHY H S

Magnetic memory unit manufacturing method, involves forming carbon solvent layer with upper surface that is provided with temporary base material, and forming first surface of graphene-containing layer with holes.

LIN H, LIN Y, SONG J, SUNG C, LIN I