国家/地区 中国（7）
IPC部 C（7）
IPC大类 C08（7）
IPC小类 C09D（7）
IPC C08K003/04（5） C01B031/04（3） C09D007/12（3）
C08K009/00（2） C09D005/24（2）
发明人 KIM S（2）
公开年 2013（7）
申请年 2013（4）  2012（3） 
专利权人

Nanographene loaded wax slurry for paint comprises superfine graphene nano particles of specific size loaded into solid wax dispersion containing wax particles of specific size, and has specific solids content and graphene and wax ratio.

YU H

Depositing graphene onto a substrate used in polymeric composites, involves transferring solubilized graphene onto the substrate in a liquid medium, where transferring occurs by changing the solubility of graphene in the liquid medium.

PAWLOSKI A R, BENNETT G S, CERNOHOUS J J, KASKE K, SZYMANSKI A E

Preparation of shielding paint involves performing Hummers preparation to obtain aqueous graphene oxide solution, dissolving in N,N'-dimethyl formamide, and modifying aqueous poly(urethane-acrylate) emulsion.

YANG D, XU J, DAI Y, QIU F, RONG X

Plate-shaped graphene powder for composition used for forming electromagnetic interference-shielding coating on article e.g. electrode of touch panel, solar cell and organic electroluminescent display device, comprises metal on surface.

LEE S, YOO H, YU K, HAN J, KIM S, SEONG B K, SEUNG H L, SUNG H L, HYUN S Y, KWAN T Y, JU K H, BAE K S, HYUK L S, HYUN L S, SEOK Y H, TAE Y K, KYUNG H J

Composition useful as an ink or coating for coating an article, comprises graphene sheets and an acid.

REDMOND K, SCHEFFER D

Insulating layer composition for use in substrate of insulating prepreg or insulating film and printed circuit board, comprises soluble type liquid crystal thermosetting oligomer, metal alkoxide compound, and graphene oxide.

JI S Y, HAM S J, KIM S H, KIM D Y, YEONG J S, JIN H S, HWAN K S, YEONG K D, CHI S, KIM S, KIM D, HAM S, CHI S Y, HAMSUKJIN

Preparation of anti-return stack graphene-containing layer and its composite material used for electrode for e.g. lithium battery, involves preparing multilayer graphene by combining expanded graphite and mixed mixture and treating.

CAI Q, HE B, LI Q, ZHENG X