国家/地区 日本（4）
IPC部 B（4）
IPC大类 B21（4）
IPC小类 B21B（4）
IPC B21B001/40（4）
发明人 CHIBA Y（4） CHIBA G（3） CHIBA YOSHIHIRO（2）
YOSHIHIRO C（2）
公开年 2013（3）
申请年 2012（3） 
专利权人 JX NIPPON MI.（4） NIPPON MININ.（3） NIPPON MININ.（3） NIPPON MININ.（2）

Copper foil used for manufacturing graphene, comprises copper with specific purity.

CHIBA Y, ONO T, CHIBA G

Copper foil for manufacturing graphene, has specified arithmetic mean roughness in rolling parallel direction and rolling perpendicular direction.

CHIBA YOSHIHIRO, CHIBA Y, CHIBA G, YOSHIHIRO C

Copper foil used for graphene manufacture, consists of copper plating layer containing hydrogen in ratio above preset value, and having glossiness above preset value in rolling parallel direction and right angle direction.

CHIBA Y

Copper foil used for manufacturing graphene, has glossiness or more than preset value, and average grain size more than preset value after being heated in atmosphere containing hydrogen and argon at specific conditions.

CHIBA YOSHIHIRO, CHIBA Y, YOSHIHIRO C, CHIBA G