国家/地区 美国（3）
IPC部 B（3）
IPC大类 C01（3）
IPC小类 C01B（3）
IPC C25F003/02（3）
发明人 GUO L（2） HAN S（2） LI X（2）
公开年 2014（2）
申请年 2012（3）
专利权人 INT BUSINESS.（2）

Electrochemical etching method for removing metal substrate layer from graphene layer, involves connecting graphene layer or metal substrate layer to power source to supply current to etch metal substrate layer from graphene layer.

HAN S, GUO L, LI X

Apparatus for electrochemical or electroplating etching of copper foils from graphene for e.g. electronic device application, has anode including metal substrate layer etched from graphene layer in response to current flowing through anode.

HAN S, GUO L, LI X

Etching graphene nanostructure, by providing piece of highly oriented pyrolytic graphite, analyzing first window, second window, and third window, and applying voltage gradient.

DARLING M J