国家/地区 韩国（3）
IPC部 C（3）
IPC大类 C01（3）
IPC小类 C01B（3）
IPC G03F001/22（3）
发明人 JOJINWOO（2） KIM H Y（2） KIM S K（2）
MI K H（2）
公开年 2022（2）
申请年 2021（3）
专利权人 KOREA ELECTR.（2）

Pellicle used for exposure to extreme UV rays, comprises substrate having opening formed in central portion, etch stop layer formed on substrate to cover opening, and nanoporous graphene layer in which nanopores are formed on graphene layer, provided on etch stop layer.

KIMHYUNGKEUN, MI K H, KIM S K, JOJINWOO, KIM H Y

Direct growth method of multilayer graphene through pressure heat treatment, comprises forming etch stop layer, forming metal catalyst layer, forming amorphous carbon layer and directly growing multilayer graphene on seed layer.

KIM H, KIM S K, MI K H, YOO C S, JOJINWOO, KIM H Y, JEONJUNHYUCK, YUNSUNGHO, SUNG K H, LEE S M

Pellicle film used in extreme UV lithography, comprises carbyne layer containing structure in which carbyne molecules are entangled by applying coating solution prepared by mixing carbyne molecules and solvent and drying.

CHOI J H, CHO S J, YU L, KIMCHUNG, SEO K, KIM K S, LEE S Y, MOON S Y, KIM C, SEO K W