国家/地区 中国（7）
IPC部 A（7）
IPC大类 A41（7）
IPC小类 A41D（7）
IPC B32B009/04（7）
发明人 CHOI K（2） HEIGHT M（2） PARK H（2）
PARK H G（2）
公开年 2021（3）
申请年 2019（2）  2020（2）  2021（2） 
专利权人 HEIQ MATERIA.（2）

Breathable protective clothing composite fabric comprises e.g. breathable bottom layer, first adhesive layer arranged on upper surface of breathable bottom layer, carbon bead layer arranged on upper surface of first adhesive layer, second adhesive layer, base fabric layer and surface layer.

ZHANG H, XU J, GE F, NI B, FANG F, ZHU G

Face mask e.g. surgical face mask, comprises mask component to cover wearer's mouth and nose, and fastener engaging with mask component comprising air-permeable outer layer, inner layer located on inner side of mask component, and graphene layer, where fastener connects mask component to wearer.

ZHAMU A, JANG B Z, ZHANG B

Formation of porous graphene layer used as semipermeable membrane, involves providing catalytically active substrate comprising copper-nickel alloy substrate, to catalyze graphene formation under chemical vapor deposition conditions.

CHOI K, PARK H G, HEIGHT M, CHOI K J, PARK H, PIAO H

Waterproof ventilating fabric used for sport suit has second base layer upper end face covered with waterproof ventilating film, and antibacterial layer and reinforcing layer set between first and second base layer.

SHEN F

Waterborne polyacrylate graphene electromagnetic shielding radiation protective clothing, comprises inner and outer layers connected together and electromagnetic shielding layer.

MA X

Down feather fabric contains outer layer of fabric containing polydicarboxyethyl germanium trioxide polytetrahydrofuran glycol ester and graphene oxide, down layer and inner layer are independently bonded together by adhesive layer.

ZHU J, MA M

Manufacture of porous graphene layer used for e.g. textile industries, involves carrying out chemical vapor deposition of carbon source on catalytically active substrate which catalyzes graphene formation, and forming graphene.

PARK H G, HEIGHT M, CHOI K, PARK H