国家/地区 加拿大（3）
IPC部 A（3）
IPC大类 A41（3）
IPC小类 A41D（3）
IPC B32B009/00（3） B32B009/04（3） A41D031/102（2）
B01D067/00（2） B01D071/02（2） C01B032/186（2）
C23C016/26（2）
发明人 CHOI K（2） HEIGHT M（2） PARK H（2）
PARK H G（2）
公开年 2021（2）
申请年
专利权人 HEIQ MATERIA.（2）

Face mask e.g. surgical face mask, comprises mask component to cover wearer's mouth and nose, and fastener engaging with mask component comprising air-permeable outer layer, inner layer located on inner side of mask component, and graphene layer, where fastener connects mask component to wearer.

ZHAMU A, JANG B Z, ZHANG B

Formation of porous graphene layer used as semipermeable membrane, involves providing catalytically active substrate comprising copper-nickel alloy substrate, to catalyze graphene formation under chemical vapor deposition conditions.

CHOI K, PARK H G, HEIGHT M, CHOI K J, PARK H, PIAO H

Manufacture of porous graphene layer used for e.g. textile industries, involves carrying out chemical vapor deposition of carbon source on catalytically active substrate which catalyzes graphene formation, and forming graphene.

PARK H G, HEIGHT M, CHOI K, PARK H