国家/地区 加拿大（6）
IPC部 A（6）
IPC大类 A41（6）
IPC小类 A41D（6）
IPC A41D013/11（3） A41D031/30（3） A62B023/02（3）
B01D067/00（3） B32B009/00（3） B32B009/04（3）
A41D031/102（2） A62B018/02（2） B01D039/16（2）
B01D046/00（2） B01D071/02（2） C01B032/186（2）
C01B032/194（2） C23C016/26（2） D06M011/74（2）
发明人 CHOI K（2） HEIGHT M（2） JANG B Z（2）
PARK H（2） PARK H G（2） ZHAMU A（2）
公开年 2021（4）
申请年 2020（3）  2021（2） 
专利权人 HEIQ MATERIA.（2） NANOTEK INST.（2）

Graphene-based personnel protection equipment product used in personnel protection equipment such as filtration device, mask, glove and face shield, comprises fabric, clothing, face shield or glove body configured to support graphene sheets.

JANG B Z, ZHAMU A

Face mask e.g. surgical face mask, comprises mask component to cover wearer's mouth and nose, and fastener engaging with mask component comprising air-permeable outer layer, inner layer located on inner side of mask component, and graphene layer, where fastener connects mask component to wearer.

ZHAMU A, JANG B Z, ZHANG B

Electrospun polymer nanofibrous membrane having high filtration efficiency comprises polyvinylidene fluoride, Tecophilic thermoplastic polyurethanes, or blend of polyvinylidene fluoride and Tecophilic thermoplastic polyurethanes.

SOLIMAN S, GUO F

Formation of porous graphene layer used as semipermeable membrane, involves providing catalytically active substrate comprising copper-nickel alloy substrate, to catalyze graphene formation under chemical vapor deposition conditions.

CHOI K, PARK H G, HEIGHT M, CHOI K J, PARK H, PIAO H

Ink useful for providing viral active or anti-microbial coating to substrate, comprises carrier, graphene or graphene oxide particles dispersed in carrier, and viral active or anti-microbial component adhered to graphene.

CHEN S W, DEVINE S, CHEN S, SANDWINTHROP C

Manufacture of porous graphene layer used for e.g. textile industries, involves carrying out chemical vapor deposition of carbon source on catalytically active substrate which catalyzes graphene formation, and forming graphene.

PARK H G, HEIGHT M, CHOI K, PARK H